Minimizing film residual stress with in situ OES big data using principal component analysis of deposited AlN films by pulsed DC reactive sputtering-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Minimizing film residual stress with in situ OES big data using principal component analysis of deposited AlN films by pulsed DC reactive sputtering

Published:2021-04-04 Issue:7-8 Volume:114 Page:1975-1990
ISSN:0268-3768
Container-title:The International Journal of Advanced Manufacturing Technology
language:en
Short-container-title:Int J Adv Manuf Technol

Author:

Lu Te-Yun,Yang Yu-Pu,Lo Hsiao-Han,Wang Peter J.,Lai Walter,Fuh Yiin-Kuen,Li Tomi T.

Funder

Delta Electronics, Inc.

Publisher

Springer Science and Business Media LLC

Subject

Industrial and Manufacturing Engineering,Computer Science Applications,Mechanical Engineering,Software,Control and Systems Engineering

Link

https://link.springer.com/content/pdf/10.1007/s00170-021-07003-8.pdf

Reference71 articles.

1. Qixin G, Akira Y (1994) Temperature dependence of band gap change in InN and AlN. Jpn J Appl Phys 33 (Part 1, No. 5A):2453-2456. https://doi.org/10.1143/JJAP.33.2453

2. Altun H, Sen S (2005) The effect of DC magnetron sputtering AlN coatings on the corrosion behaviour of magnesium alloys. Surf Coat Technol 197(2-3):193–200. https://doi.org/10.1016/j.surfcoat.2004.06.001

3. Vissutipitukul P, Aizawa T (2005) Wear of plasma-nitrided aluminum alloys. Wear 259(1-6):482–489. https://doi.org/10.1016/j.wear.2005.02.119

4. Morkoç H, Strite S, Gao G-B, Lin M-E, Sverdlov B, Burns M (1994) Large-band-gap SiC, III-V nitride, and II-VI ZnSe-based semiconductor device technologies. J Appl Phys 76(3):1363–1398. https://doi.org/10.1063/1.358463

5. Qiu J-Y, Hotta Y, Watari K, Mitsuishi K, Yamazaki M (2006) Low-temperature sintering behavior of the nano-sized AlN powder achieved by super-fine grinding mill with Y2O3 and CaO additives. J Eur Ceram Soc 26(4-5):385–390. https://doi.org/10.1016/j.jeurceramsoc.2005.06.016

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Experimental investigation of Aluminum Nitride ceramics based on compliant finishing process;Journal of Manufacturing Processes;2024-09

2. Impact of Pulse Parameters of a DC Power Generator on the Microstructural and Mechanical Properties of Sputtered AlN Film with In-Situ OES Data Analysis;Materials;2023-04-11

3. Minimizing residual stress of aluminum nitride (AlN) thin films using multi-step deposition of DC pulsed sputtering;2022 China Semiconductor Technology International Conference (CSTIC);2022-06-20

4. Residual stress classification of pulsed DC reactive sputtered aluminum nitride film via large-scale data analysis of optical emission spectroscopy;The International Journal of Advanced Manufacturing Technology;2022-01-25

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3