Impact of thermodynamic fluctuations and pattern size on the nucleation behavior during area selective deposition
Author:
Affiliation:
1. Applied Materials Division, Argonne National Laboratory, Lemont, Illinois 60439
Funder
Argonne National Laboratory
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/am-pdf/10.1116/1.5141355
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
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2. Tuning Molecular Inhibitors and Aluminum Precursors for the Area-Selective Atomic Layer Deposition of Al2O3;Chemistry of Materials;2022-05-10
3. Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors;The Journal of Physical Chemistry C;2022-03-08
4. Next generation nanopatterning using small molecule inhibitors for area-selective atomic layer deposition;Journal of Vacuum Science & Technology A;2021-03
5. Area-Selective Deposition of Ruthenium by Area-Dependent Surface Diffusion;Chemistry of Materials;2020-11-06
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