Modeling of magnetically enhanced capacitively coupled plasma sources: Two frequency discharges
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Effects of magnetic field on the secondary electron asymmetry effect in capacitively coupled plasmas;Physics of Plasmas;2021-12
2. Resonant sheath heating in weakly magnetized capacitively coupled plasmas due to electron-cyclotron motion;Physical Review E;2021-10-22
3. Electron dynamics in radio frequency magnetron sputtering argon discharges with a dielectric target;Plasma Sources Science and Technology;2021-03-01
4. Electrical asymmetry effect in inhomogeneously magnetized capacitively coupled plasmas;Plasma Sources Science and Technology;2020-11-01
5. Experimental investigations of the magnetic asymmetry effect in capacitively coupled radio frequency plasmas;Plasma Sources Science and Technology;2018-10-25
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