Effects of magnetic field on the secondary electron asymmetry effect in capacitively coupled plasmas-Reference-Cited by-同舟云学术

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Effects of magnetic field on the secondary electron asymmetry effect in capacitively coupled plasmas

Published:2021-12 Issue:12 Volume:28 Page:123505
ISSN:1070-664X
Container-title:Physics of Plasmas
language:en
Short-container-title:Physics of Plasmas

Author:

Yang Shali¹^ORCID,Zhang Tianxiang²,Lin Hanlei¹,Wu Hao³^ORCID,Zhang Qiang¹

Affiliation:

1. College of Science, University of Shanghai for Science and Technology, Shanghai 200093, China

2. Shanghai Aerospace Control Technology Institute, Shanghai 201109, China

3. School of Physics, Huazhong University of Science and Technology, Wuhan 430074, China

Funder

National Natural Science Foundation of China

Shanghai Sailing Program

Publisher

AIP Publishing

Subject

Condensed Matter Physics

Link

https://aip.scitation.org/doi/pdf/10.1063/5.0068101

Reference54 articles.

1. Principles of Plasma Discharges and Materials Processing

2. A comparative study of capacitively coupled HBr/He, HBr/Ar plasmas for etching applications: Numerical investigation by fluid model

3. Numerical study of capacitive coupled HBr/Cl2 plasma discharge for dry etch applications

4. Electrostatic modelling of dual frequency rf plasma discharges

5. The effect of secondary electrons on the separate control of ion energy and flux in dual-frequency capacitively coupled radio frequency discharges

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