Inductively coupled plasma etching of bulk, single-crystal Ga2O3
Author:
Affiliation:
1. Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611
2. Tamura Corporation and Novel Crystal Technology, Inc., Sayama, Saitama 350-1328, Japan
Publisher
American Vacuum Society
Subject
Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials
Link
http://avs.scitation.org/doi/am-pdf/10.1116/1.4982714
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