Metal etching with organic based plasmas. II. CO∕NH[sub 3] plasmas

Author:

Orland A. S.,Blumenthal R.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

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