Effect of the sintering process on the formation and passivation of PtSi-Reference-Cited by-同舟云学术

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Effect of the sintering process on the formation and passivation of PtSi

Published:1986-05 Issue:3 Volume:4 Page:841-844
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Chang Chin‐An,Segmüller A.,Huang H.‐C. W.,Turene F. E.,Cunningham B.,Totta P. A.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.573787

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Growth of silica nanowires in vacuum;CrystEngComm;2015

2. The Pt/Si(111) interface and the properties of thin Pt layers on Si;Physica Scripta;1994-01-01

3. PtSi contact metallurgy formed by three‐temperature annealing sequences and short annealing time;Journal of Applied Physics;1987-01

4. Formation of PtSi Using Polycrystalline Si and Different Annealing Sequences;MRS Proceedings;1987

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