Tip-based electron beam induced deposition using active cantilevers-Reference-Cited by-同舟云学术

Tip-based electron beam induced deposition using active cantilevers

Published:2019-11 Issue:6 Volume:37 Page:061812
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Holz Mathias¹²,Allen Frances I.³⁴^ORCID,Reuter Christoph¹²,Ahmad Ahmad¹²,Hofmann Martin²,Reum Alexander¹,Ivanov Tzvetan²,Rangelow Ivo W.¹²^ORCID

Affiliation:

1. nano analytik GmbH, 98693 Ilmenau, Germany

2. Department of Micro- and Nanoelectronic Systems, Technische Universität Ilmenau, 98693 Ilmenau, Germany

3. Department of Materials Science and Engineering, University of California, Berkeley, California 94720

4. National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720

Funder

European Union Seventh Framework Program

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5123287

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