Electron cyclotron resonance plasma etching of GaSb in Cl[sub 2]/BCl[sub 3]/CH[sub 4]/Ar/H[sub 2] at room temperature
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Published:2003
Issue:4
Volume:21
Page:1511
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:en
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Short-container-title:J. Vac. Sci. Technol. B
Author:
Langer J. P.,Dutta P. S.
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
12 articles.
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