The inverted horizontal reactor: Growth of uniform InP and GaInAs by LPMOCVD-Reference-Cited by-同舟云学术

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The inverted horizontal reactor: Growth of uniform InP and GaInAs by LPMOCVD

Published:1988-09 Issue:5 Volume:17 Page:381-386
ISSN:0361-5235
Container-title:Journal of Electronic Materials
language:en
Short-container-title:JEM

Author:

Puetz N.,Hillier G.,Springthorpe A. J.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/BF02652122.pdf

Reference25 articles.

1. C. H. Chen, M. Kitamura, R. M. Cohen and G. B. String-fellow, Appl. Phys. Lett. 49, 963 (1986).

2. S. J. Bass, S. J. Barnett, G. T. Brown, N. G. Chew, A. G. Cullis, A. D. Pitt and M. S. Skolnik, J. Cryst. Growth 79, 378 (1986).

3. J. P. Andre, E. P. Menu, M. Erman, M. H. Meynadier and T. Ngo, J. Electron. Mater. 15, 71 (1986).

4. M. S. Skolnik, P. R. Tapster, S. J. Bas, N. Apsley, A. D. Pitt, N. G. Chew, A. G. Cullis, S. P. Aldred and C. A. Warwick, Appl. Phys. Let. 48, 1455 (1986).

5. M. Razeghi, P. Maurel, A. Tardella, L. Dmowski, D. Gautheir and J. C. Portal, J. Appl. Phys. 60, 2453 (1986).

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