Study of DC Sputtered Undoped NiO Thin Films
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Publisher
Springer Nature Singapore
Link
https://link.springer.com/content/pdf/10.1007/978-981-19-2468-2_15
Reference13 articles.
1. Subramanian B et al (2008) Optoelectronic and electrochemical properties of nickel oxide (NiO) films deposited by DC reactive magnetron sputtering. Phys B Condens Matter 403(21–22):4104–4110. https://doi.org/10.1016/j.physb.2008.08.014
2. Murphy TP, Hutchins MG (1995) Oxidation states in nickel oxide electrochromism. Sol Energy Mater Sol Cells 39(2–4):377–389. https://doi.org/10.1016/0927-0248(96)80003-1
3. Diao CC, Huang CY, Yang CF, Wu CC (2020) Morphological, optical, and electrical properties of p-type nickel oxide thin films by non-vacuum deposition. Nanomaterials 10(4). https://doi.org/10.3390/nano10040636. Williams ACC, Davies HTO, Chadury Y (2000) Simple pain rating scales hide complex idiosyncratic meanings. Pain 85(3):457–463
4. Salunkhe P, Muhammed Ali AV, Kekuda D (2020) Investigation on tailoring physical properties of Nickel Oxide thin films grown by dc magnetron sputtering. Mater Res Express 7(1). https://doi.org/10.1088/2053-1591/ab69c5
5. Chen SC, Kuo TY, Lin HC, Chen RZ, Sun H (2020) Optoelectronic properties of p-type NiO films deposited by direct current magnetron sputtering versus high power impulse magnetron sputtering. Appl Surf Sci 508:145106. https://doi.org/10.1016/j.apsusc.2019.145106
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