Optoelectronic and electrochemical properties of nickel oxide (NiO) films deposited by DC reactive magnetron sputtering-Reference-Cited by-同舟云学术

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Optoelectronic and electrochemical properties of nickel oxide (NiO) films deposited by DC reactive magnetron sputtering

Published:2008-11 Issue:21-22 Volume:403 Page:4104-4110
ISSN:0921-4526
Container-title:Physica B: Condensed Matter
language:en
Short-container-title:Physica B: Condensed Matter

Author:

Subramanian B.,Mohamed Ibrahim M.,Senthilkumar V.,Murali K.R.,Vidhya VS.,Sanjeeviraja C.,Jayachandran M.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference27 articles.

1. Electronic structure of NiO

2. Magnetic linear dichroism studies of in situ grown NiO thin films

3. Preparation of transparent and semiconducting NiO films

4. Preferred orientations of NiO thin films prepared by RF magnetron sputtering

5. Opto-structural, electrical and electrochromic properties of crystalline nickel oxide thin films prepared by spray pyrolysis

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1. Ultra-fast switching of energy efficient electrochromic nickel oxide thin films for smart window applications;Ceramics International;2024-10

2. Influence of H2 on the properties of NiOxHy thin films deposited by reactive direct current magnetron sputtering for electrochromic devices;Thin Solid Films;2024-08

3. Enhanced electrochemical activity of chemically engineered rGO-decorated NiO/CoFe2O4 for supercapacitor applications;Ceramics International;2024-06

4. Structural, optical and humidity sensing studies of nickel oxide (NiO) nanoparticles: effect of calcination temperature;Chemical Papers;2024-02-27

5. Unusual tilted growth and epitaxial relationship of NaCl B1-structured NiO and CrN on r-plane Al2O3;Journal of Applied Physics;2024-02-12

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