Monocrystalline Quartz ICP Etching: Road to High-Temperature Dry Etching
Author:
Publisher
Springer Science and Business Media LLC
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry
Link
http://link.springer.com/content/pdf/10.1007/s11090-019-10025-6.pdf
Reference28 articles.
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2. Ujiie T, Kikuchi T, Ichiki T, Horiike Y (2000) Fabrication of quartz microcapillary electrophoresis chips using plasma etching. Jpn J Appl Phys 39:3677. https://doi.org/10.1143/JJAP.39.3677
3. Lee S (2001) Photolithography and selective etching of an array of quartz tuning fork resonators with improved impact resistance characteristics. Jpn J Appl Phys 40:5164. https://doi.org/10.1143/JJAP.40.5164
4. Li L, Abe T, Esashi M (2004) Fabrication of miniaturized bi-convex quartz crystal microbalance using reactive ion etching and melting photoresist. Sens Actuators A 114:496–500. https://doi.org/10.1016/j.sna.2003.12.031
5. Knieling T, Shafi M, Lang W, Benecke W (2012) Microlens array production in a microtechnological dry etch and reflow process for display applications. J Eur Opt Soc Rapid Publ. https://doi.org/10.2971/jeos.2012.12007
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