Photolithography and Selective Etching of an Array of Quartz Tuning Fork Resonators with Improved Impact Resistance Characteristics-Reference-Cited by-同舟云学术

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Photolithography and Selective Etching of an Array of Quartz Tuning Fork Resonators with Improved Impact Resistance Characteristics

Published:2001-08-15 Issue:Part 1, No. 8 Volume:40 Page:5164-5167
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Lee Sungkyu

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Application of standard and custom quartz tuning forks for quartz-enhanced photoacoustic spectroscopy gas sensing;Applied Spectroscopy Reviews;2022-05-15

2. Single pulse development of chromium-deposited imprint micro/nano patterns of photo-cured crosslinked resin using a femtosecond pulsed laser;Japanese Journal of Applied Physics;2021-03-25

3. Monocrystalline Quartz ICP Etching: Road to High-Temperature Dry Etching;Plasma Chemistry and Plasma Processing;2019-09-05

4. Development of Process for Fast Plasma-Chemical Through Etching of Single-Crystal Quartz in SF6/O2 Gas Mixture;Russian Journal of Applied Chemistry;2018-08

5. Femtosecond Bessel-beam-assisted high-aspect-ratio microgroove fabrication in fused silica;Chinese Optics Letters;2015

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