A Comparative Study of HBr-Ar and HBr-Cl2 Plasma Chemistries for Dry Etch Applications-Reference-Cited by-同舟云学术

A Comparative Study of HBr-Ar and HBr-Cl2 Plasma Chemistries for Dry Etch Applications

Published:2010-12-29 Issue:2 Volume:31 Page:259-271
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

Efremov Alexander,Kim Youngkeun,Lee Hyun-Woo,Kwon Kwang-Ho

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s11090-010-9279-7.pdf

Reference40 articles.

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5. Bazin A, Pargon E, Mellhaoui X, Perret D, Mortini B, Joubert O (2008) Advances in resist materials and processing technology XXV. In: Henderson CL (ed) Proceedings of the SPIE. 6923, p 692337

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