Ion-implantation doping of semiconductors
Author:
Publisher
Springer Science and Business Media LLC
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Link
http://link.springer.com/content/pdf/10.1007/BF00752224.pdf
Reference30 articles.
1. R. S. Ohl,Bell Syst. Tech. J. 31 (1952) 104.
2. W. D. Cussins,Proc. Phys. Soc. 68 (1955) 213.
3. F. M. Rourke, J. C. Sheffield, andF. A. White,Rev. Sci. Instr. 32 455.
4. J. O. Mccaldin andA. E. Widmer,J. Phys. Chem. Solids 24 (1963) 1073.
5. R. R. Ferber,Trans. IEEE Nucl Sci. NS10 (1963). 15.
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