Yttrium Oxyfluoride Coating Deposited with a Y5O4F7/YF3 Suspension by Suspension Plasma Spraying Under Atmospheric Pressure
Author:
Publisher
Springer Science and Business Media LLC
Subject
Materials Chemistry,Surfaces, Coatings and Films,Condensed Matter Physics
Link
https://link.springer.com/content/pdf/10.1007/s11666-022-01393-1.pdf
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5. Y. Kim, S. Lee, Y. Cho, S. Kim, and H. Chae, Plasma Atomic Layer Etching of SiO2 and Si3N4 with Heptafluoropropyl Methyl Ether (C3F7OCH3), J. Vac. Sci. Technol. A Vac. Surf. Films, 2020, 38(2), p 022606.
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