Author:
Shveigert V. A.,Zhilyaev M. I.,Shveigert I. V.
Publisher
Springer Science and Business Media LLC
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics
Reference19 articles.
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4. M. J. Kushner, “On the balance between silylene and silyl radicals in rf glow discharges in silane: the effect on deposition of α-Si:H,” J. Appl. Phys.,62, 2803 (1987).
5. M. J. Kushner, “A phenomenological model for surface deposition kinetics during plasma and sputter deposition of amorphous hydrogenated silicon,” J. Appl. Phys.,62, 4763 (1987).
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