Distributed Simulation of Silicon-Based Film Growth-Reference-Cited by-同舟云学术

Distributed Simulation of Silicon-Based Film Growth

Published:2002 Issue: Volume: Page:879-887
ISSN:0302-9743
Container-title:Parallel Processing and Applied Mathematics
language:
Short-container-title:

Author:

Krzhizhanovskaya V. V.,Zatevakhin M. A.,Ignatiev A. A.,Gorbachev Y. E.,Sloot P. M. A.

Publisher

Springer Berlin Heidelberg

Link

http://link.springer.com/content/pdf/10.1007/3-540-48086-2_98

Reference12 articles.

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3. M.N. Kogan. Dynamics of rarefied gas. Moscow, Nauka, 1967 (in Russian)

4. Yu.E. Gorbachev, M.A. Zatevakhin, I.D. Kaganovich. Simulation of the growth of hydrogenated amorphous silicon films from an rf plasma. Tech. Phys. V. 41, N 12, 1996, pp. 1247–1258

5. S.K. Godunov, V.S. Riabenkii. Difference schemes. Moscow, Nauka, 1973

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