Effect of oligomers on the growth of amorphous silicon films in a PECVD reactor-Reference-Cited by-同舟云学术

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Effect of oligomers on the growth of amorphous silicon films in a PECVD reactor

Published:2006-06 Issue:6 Volume:51 Page:733-739
ISSN:1063-7842
Container-title:Technical Physics
language:en
Short-container-title:Tech. Phys.

Author:

Gorbachev Yu. E.

Publisher

Pleiades Publishing Ltd

Subject

Physics and Astronomy (miscellaneous)

Link

http://link.springer.com/content/pdf/10.1134/S1063784206060089.pdf

Reference17 articles.

1. Yu. E. Gorbachev, M. A. Zatevakhin, and I. D. Kaganovich, Zh. Tekh. Fiz. 66(12), 89 (1996) [Tech. Phys. 42, 1247 (1996)].

2. Yu. E. Gorbachev, M. A. Zatevakhin, V. V. Krzhizhanovskaya, and V. A. Shveigert, Zh. Tekh. Fiz. 70(8), 77 (2000) [Tech. Phys. 45, 1032 (2000)].

3. M. J. Kushner, J. Appl. Phys. 63, 2532 (1988).

4. J. Perrin, O. Leroy, and M. C. Bordage, Contrib. Plasma Phys. 36, 3 (1996).

5. P. Roca i Cabarrocas, J. Non-Cryst. Solids 37, 64 (1993).

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