Bayesian spatial defect pattern recognition in semiconductor fabrication using support vector clustering-Reference-Cited by-同舟云学术

Bayesian spatial defect pattern recognition in semiconductor fabrication using support vector clustering

Published:2010-05-05 Issue:5-8 Volume:51 Page:671-683
ISSN:0268-3768
Container-title:The International Journal of Advanced Manufacturing Technology
language:en
Short-container-title:Int J Adv Manuf Technol

Author:

Yuan Tao,Bae Suk Joo,Park Jong In

Publisher

Springer Science and Business Media LLC

Subject

Industrial and Manufacturing Engineering,Computer Science Applications,Mechanical Engineering,Software,Control and Systems Engineering

Link

http://link.springer.com/content/pdf/10.1007/s00170-010-2647-x.pdf

Reference31 articles.

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