Removal characteristics and performance of brick-shape permanent magnet–assisted magnetorheological lapping-Reference-Cited by-同舟云学术

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Removal characteristics and performance of brick-shape permanent magnet–assisted magnetorheological lapping

Published:2019-11-15 Issue:10 Volume:105 Page:4461-4480
ISSN:0268-3768
Container-title:The International Journal of Advanced Manufacturing Technology
language:en
Short-container-title:Int J Adv Manuf Technol

Author:

Wang Yongqiang,Xu Zhiqiang,Yin Shaohui

Funder

the Natural Science Foundation of Hunan province

the Foundation of Education Department of the Hunan province

the Youth Program of National Natural Science Foundation of China

the National Natural Science Foundation of China

Publisher

Springer Science and Business Media LLC

Subject

Industrial and Manufacturing Engineering,Computer Science Applications,Mechanical Engineering,Software,Control and Systems Engineering

Link

http://link.springer.com/content/pdf/10.1007/s00170-019-04531-2.pdf

Reference37 articles.

1. Zwicker G (2016) Applications of chemical mechanical planarization (CMP) to more than Moore devices. Adv Chem Mech Planarization CMP:463–485

2. Asghar K, Qasim M, Nelabhotla DM, Das D (2016) Effect of surfactant and electrolyte on surface modification of c-plane GaN substrate using chemical mechanical planarization (CMP) process. Colloids Surf A Physicochem Eng Asp 497:133–145

3. Zhou Y, Pan GS, Shi XL, Zhang SM, Gong H, Luo GH (2015) Effects of ultra-smooth surface atomic step morphology on chemical mechanical polishing (CMP) performances of sapphire and SiC wafers. Tribol Int 87:145–150

4. Cho BJ, Kim HM, Manivannan R, Moon DJ, Park JG (2013) On the mechanism of material removal by fixed abrasive lapping of various glass substrates. Wear 302:1334–1339

5. Lee H, Kasuga H, Ohmori H, Lee H, Jeong H (2011) Application of electrolytic in-process dressing (ELID) grinding and chemical mechanical polishing (CMP) process for emerging hard-brittle materials used in light-emitting diodes. J Cryst Growth 326:140–146

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1. Advance Chemical Mechanical Polishing Technique for Gallium Nitride Substrate;Advanced Materials Interfaces;2024-03-04

2. Investigation on roller-type ultrasonic assisted magnetorheological finishing for biomedical small and complex surface of titanium alloy;Materials Today Communications;2024-03

3. Study on process optimization of ultrasound assisted magneto-rheological polishing of sapphire hemisphere surface based on Fe3O4/SiO2 core-shell abrasives;Tribology International;2023-03

4. Material removal mechanism of non-resonant vibration-assisted magnetorheological finishing of silicon carbide ceramics;International Journal of Mechanical Sciences;2023-03

5. Material removal mechanism in magnetorheological foam plane finishing;Journal of Manufacturing Processes;2023-02

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