Application of electrolytic in-process dressing (ELID) grinding and chemical mechanical polishing (CMP) process for emerging hard–brittle materials used in light-emitting diodes-Reference-Cited by-同舟云学术

Application of electrolytic in-process dressing (ELID) grinding and chemical mechanical polishing (CMP) process for emerging hard–brittle materials used in light-emitting diodes

Published:2011-07 Issue:1 Volume:326 Page:140-146
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Lee Hyunseop,Kasuga Hiroshi,Ohmori Hitoshi,Lee Hojun,Jeong Haedo

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference25 articles.

1. Method of surface treatment on sapphire substrate;Niu;Trans. Nonferrous Met. Soc. Chin.,2006

2. Dichromatic InGaN-based white light emitting diodes by using laser lift-off and wafer-bonding schemes;Lee;Appl. Phys. Lett.,2007

3. High power ultraviolet light emitting diodes based on GaN/AlGaN quantum wells produced by molecular beam epitaxy;Cabalu;J. Appl. Phys.,2006

4. Planarization machining of sapphire wafers with boron carbide and colloidal silica as abrasives;Hu;Appl. Surf. Sci.,2009

5. Chemical planarization of GaN using hydroxyl radicals generated on a catalyst plate in H2O2 solution;Murata;J. Cryst. Growth,2008

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