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2. W. Kern: RCA Engineer, 99 (July/August 1993 ).
3. T. Hattori: et al.: Survey of the Wafer Cleaning Specifications of Semiconductor Manufacturers No.1, Science Forum, Tokyo, 1993, and also No. 2, 1994 [in Japanese].
4. T. Ohmi: Proceedings of the 8th Workshop on Ultra Clean Technology, Tokyo, 3 (12/1990).
5. Technical notes by chemical companies such as Hashimoto Chemical, Kanto Chemical, etc.