Oxygen-free precursor for chemical vapor deposition of gold films: thermal properties and decomposition mechanism-Reference-Cited by-同舟云学术

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Oxygen-free precursor for chemical vapor deposition of gold films: thermal properties and decomposition mechanism

Published:2011-09 Issue:3 Volume:44 Page:177-184
ISSN:2190-7579
Container-title:Gold Bulletin
language:en
Short-container-title:Gold Bull

Author:

Turgambaeva Asiya E.,Zharkova Galina,Semyannikov Petr,Krisyuk Vladislav V.,Koretskaya Tatyana,Trubin Sergey,Kuchumov Boris,Igumenov Igor

Publisher

Springer Science and Business Media LLC

Subject

Inorganic Chemistry,General Materials Science

Link

http://www.springerlink.com/index/pdf/10.1007/s13404-011-0026-5

Reference26 articles.

1. Bishop PT, Ashfield LJ, Berzins A, Boardman A, Buche V, Cookson J, Gordon RJ, Salcianu C, Sutton PA (2010) Printed gold for electronic applications. Gold Bulletin 43:181–188

2. Lee J-S (2010) Recent progress in gold nanoparticle-based non-volatile memory devices. Gold Bulletin 43:189–199

3. He L, Shi ZQ (1996) Thin metal films deposited at low temperature for optoelectronic device application. J Vac Sci Technol A14:704–708

4. Morishige Y, Kishida S (1994) Thick gold-film deposition by high-repetition visible pulsed-laser chemical vapor deposition. Appl Phys A59:395–399

5. Armelles G, Gonzalez-Diaz J, Garcia-Martin A, Garcia-Martin J, Cebollada A, Gonzalez M, Acimovic S, CesarioJ QR, Badenes G (2008) Localized surface plasmon resonance effects on the magneto-optical activity of continuous Au/Co/Au trilayers. Optics Express 16(20):16104–16112

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