Evaluation of microlithographic performance of ‘deep UV’ resists: Synthesis, and 2D NMR studies on alternating ‘high ortho’ novolak resins-Reference-Cited by-同舟云学术

Evaluation of microlithographic performance of ‘deep UV’ resists: Synthesis, and 2D NMR studies on alternating ‘high ortho’ novolak resins

Published:2012-03 Issue:2 Volume:124 Page:395-401
ISSN:0974-3626
Container-title:Journal of Chemical Sciences
language:en
Short-container-title:J Chem Sci

Author:

SHARMA MANEESH,NAIK ANANT A,RAGHUNATHAN P,ESWARAN S V

Publisher

Springer Science and Business Media LLC

Subject

General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s12039-011-0159-3.pdf

Reference28 articles.

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4. Wallraff GM and Hinsberg WD 1999 Chem. Rev. 99 1801

5. Ueno T 1998 Chemistry of Photoresist Material. In ‘Microlithography science and technology’, Sheats J R, Smith B W (eds.), Marcel Dekker, Inc. New York, USA, p. 429

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