1. Bogdanov A, Peredkov S (2000) Use of SU-8 photoresist for very high aspect ratio X-ray lithography. Microelectron Eng 53:493–496
2. Goettert J, Ahrens G, Bednarzik M, Degen R, Desta Y, Gruetzner G, Jian L, Loechel B, Ruhmann R, Jin Y (2002) Cost effective fabrication of high precision microstructures using a Direct-LIGA approach. In: Proceedings COMS 2002, Ypsilanti, Michigan, September 2002
3. Scheunemann H-U, Loechel B, Jian L, Desta Y, Goettert J (2003) Cost-effective masks for deep x-ray lithography. Proc SPIE 5116:775–781
4. Kouba J, Bednarzik M, Engelke R, Ahrens G, Miller H, Haase D (2006) Optimizing SU-8 resist to fabricate micro-metallic structures. Solid State Technol 49:39–44
5. Loechel B, Goettert J, Desta YM (2007) Direct LIGA service for prototyping: status report. Microsyst Technol 13:327–334