Structure quality in deep X-ray lithography applying commercial polyimide-based masks-Reference-Cited by-同舟云学术

Structure quality in deep X-ray lithography applying commercial polyimide-based masks

Published:2006-06-10 Issue:3-4 Volume:13 Page:349-353
ISSN:0946-7076
Container-title:Microsystem Technologies
language:en
Short-container-title:Microsyst Technol

Author:

Achenbach Sven,Boerner Martin,Kinuta Seichin,Bacher Walter,Mohr Juergen,Saile Volker,Saotome Yasunori

Publisher

Springer Science and Business Media LLC

Subject

Electrical and Electronic Engineering,Hardware and Architecture,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/s00542-006-0223-y.pdf

Reference9 articles.

1. Achenbach S, Pantenburg FJ, Mohr J (2000) Optimization of the process conditions for the fabrication of microstructures by ultra deep X-Ray lithography (UDXRL). Forschungszentrum Karlsruhe, FZKA 6576, Karlsruhe

2. Becker EW, Ehrfeld W, Hagmann P, Maner A, Münchmeyer D (1986) Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process). Microelectr Eng 4(1):36–56

3. Desta Y, Loechel B, Goettert J (2006) X-ray masks for the LIGA process. Microsystems Tech (in press)

4. Kupka R, Megtert S et al (1998) Transparent masks for aligned deep XRL/LIGA [...]. Proc SPIE 3512:271–276

5. Mohr J, Ehrfeld W, Muenchmeyer D (1988) Analyse der Defektursachen und der Genauigkeit der Strukturübertragung bei der Röntgentiefenlithographie mit Synchrotronstrahlung. Kernforschungszentrum, Karlsruhe, KfK 4414

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