Scaling up the sub-50 nm-resolution roll-to-roll nanoimprint lithography process via large-area tiling of flexible molds and uniform linear UV curing-Reference-Cited by-同舟云学术

Scaling up the sub-50 nm-resolution roll-to-roll nanoimprint lithography process via large-area tiling of flexible molds and uniform linear UV curing

Published:2022-12-31 Issue:1 Volume:37 Page:271-278
ISSN:1738-494X
Container-title:Journal of Mechanical Science and Technology
language:en
Short-container-title:J Mech Sci Technol

Author:

Moon Chang Ho,Han Kang-Soo,Kim Minwook,Oh Dong Kyo,Yi Sol,Kim Taehyun,Kim Hongkyu,Hwang Jaehyun,Nam Jung Gun,Lee Dong-Eon,Lee Dae-Young,Jo Gug Rae,Ok Jong G.

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials

Link

https://link.springer.com/content/pdf/10.1007/s12206-022-1227-y.pdf

Reference33 articles.

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4. J. S. Wi, S. Lee, S. H. Lee, D. K. Oh, K. T. Lee, I. Park, M. K. Kwak and J. G. Ok, Facile three-dimensional nanoarchitecturing of double-bent gold strips on roll-to-roll nanoimprinted transparent nanogratings for flexible and scalable plasmonic sensors, Nanoscale, 9 (4) (2017) 1398–1402.

5. C. Zhang, H. Subbaraman, Q. C. Li, Z. Y. Pan, J. G. Ok, T. Ling, C. J. Chung, X. Y. Zhang, X. H. Lin, R. T. Chen and L. J. Guo, Printed photonic elements: nanoimprinting and beyond, J. of Materials Chemistry C, 4 (23) (2016) 5133–5153.

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