Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Author:

Zhan Yujie1,Deng Liangui23,Dai Wei4,Qiu Yongxue1ORCID,Sun Shicheng1,Sun Dizhi1,Hu Bowen1,Guan Jianguo1ORCID

Affiliation:

1. State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, School of Materials Science and Engineering, Wuhan University of Technology, Wuhan 430070, China

2. School of Information Engineering, Wuhan University of Technology, Wuhan 430070, China

3. Suzhou Institute, Wuhan University, Suzhou 215028, China

4. Center for Nanoscience and Nanotechnology, Key Laboratory of Artificial Micro- and Nano-Structures of Ministry of Education, School of Physics and Technology, Wuhan University, Wuhan 430072, China

Abstract

Nanostructures with sufficiently large areas are necessary for the development of practical devices. Current efforts to fabricate large-area nanostructures using step-and-repeat nanoimprint lithography, however, result in either wide seams or low efficiency due to ultraviolet light leakage and the overflow of imprint resin. In this study, we propose an efficient method for large-area nanostructure fabrication using step-and-repeat nanoimprint lithography with a composite mold. The composite mold consists of a quartz support layer, a soft polydimethylsiloxane buffer layer, and multiple intermediate polymer stamps arranged in a cross pattern. The distance between the adjacent stamp pattern areas is equal to the width of the pattern area. This design combines the high imprinting precision of hard molds with the uniform large-area imprinting offered by soft molds. In this experiment, we utilized a composite mold consisting of three sub-molds combined with a cross-nanoimprint strategy to create large-area nanostructures measuring 5 mm × 30 mm on a silicon substrate, with the minimum linewidth of the structure being 100 nm. Compared with traditional step-and-flash nanoimprint lithography, the present method enhances manufacturing efficiency and generates large-area patterns with seam errors only at the micron level. This research could help advance micro–nano optics, flexible electronics, optical communication, and biomedicine studies.

Funder

National Key Research and Development Program of China

Natural Science Foundation of Jiangsu Province

Fundamental Research Funds for the Central Universities

Publisher

MDPI AG

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