Improved Drain Current Characteristics of Germanium Source Triple Material Double Gate Hetero-Dielectric Stacked TFET for Low Power Applications
Author:
Publisher
Springer Science and Business Media LLC
Subject
Electronic, Optical and Magnetic Materials
Link
https://link.springer.com/content/pdf/10.1007/s12633-020-00556-5.pdf
Reference33 articles.
1. Young KK (1989) Short-channel effect in fully depleted SOI MOSFETs. IEEE Trans Electron Devices 36(2):399–402
2. Belaid MA, Nahhas AM, Gares M, Daoud K, Latry O (2014) Leakage current effects on N-MOSFETs after thermal ageing in pulsed life tests. Microelectron J 45(12):1800–1805
3. Wu J, Min J, Taur Y (2015) Short Channel Effects in Tunnel FETs. IEEE Trans Electron Devices 62(9):3019–3024
4. Qin Z, Wei Z, Seabaugh A (2006) Low-subthreshold swing tunnel transistors. IEEE Electron device Lett 27(4):297–300
5. Vishnoi R, Kumar MJ (2014) Compact analytical model of Dual Material Gate Tunneling Field-Effect Transistor using Interband Tunneling and Channel Transport. IEEE Trans Electron Devices 61(6):1936–1942
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