A Study on Dual Dielectric Pocket Heterojunction SOI Tunnel FET Performance and Flicker Noise Analysis in Presence of Interface Traps

Author:

Das Debika,Chakraborty Ujjal

Publisher

Springer Science and Business Media LLC

Subject

Electronic, Optical and Magnetic Materials

Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. GaAs-on-insulator based vertical heterojunction tunnel FET: proposal and analysis for VLSI circuit applications;Physica Scripta;2024-07-24

2. Analyze and Optimize the Performance of InGaN-Based DG-JL-TFET Through Efficient Design and Investigation;2024 International Conference on Distributed Computing and Optimization Techniques (ICDCOT);2024-03-15

3. More-than-moore steep slope devices for higher frequency switching applications: a designer’s perspective;Physica Scripta;2024-03-11

4. A Comprehensive Review on the Single Gate, Double Gate, Tri-Gate, and Heterojunction Tunnel FET for Future Generation Devices;Silicon;2022-10-27

5. Noise Analysis in Nanostructured Tunnel Field Devices;21st Century Nanostructured Materials - Physics, Chemistry, Classification, and Emerging Applications in Industry, Biomedicine, and Agriculture;2022-04-20

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