Microstructure and mechanical properties of AlN films obtained by plasma enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

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Microstructure and mechanical properties of AlN films obtained by plasma enhanced chemical vapor deposition

Published:2009-11 Issue:22 Volume:44 Page:6125-6134
ISSN:0022-2461
Container-title:Journal of Materials Science
language:en
Short-container-title:J Mater Sci

Author:

Sánchez Gustavo,Abdallah B.,Tristant P.,Dublanche-Tixier C.,Djouadi M. A.,Besland M. P.,Jouan P. Y.,Bologna Alles A.

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/s10853-009-3847-3.pdf

Reference28 articles.

1. Tonisch K, Cimalla V, Foerster Ch, Romanus H, Ambacher O, Dontsov D (2006) Sens Actuators A 132:658

2. Sánchez G, Wu A, Tristant P, Tixier C, Soulestin B, Desmaison J, Bologna Alles A (2008) Thin Solid Films 516:4868

3. Sanz-Hervás A, Clement M, Iborra E, Vergara L, Olivares J, Sangrador J (2006) Appl Phys Lett 88:161915

4. Semond F, Cordier Y, Grandjean N, Natali F, Damilano B, Vézian S, Massies J (2001) Phys Status Solidi A 188:501

5. Chen CS, Hwang BH, Lu HY, Hsu TC (2002) J Phys D Appl Phys 35:2608

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