Columnar structure of reactively sputtered aluminium nitride films-Reference-Cited by-同舟云学术

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Columnar structure of reactively sputtered aluminium nitride films

Published:2002-10-10 Issue:20 Volume:35 Page:2608-2613
ISSN:0022-3727
Container-title:Journal of Physics D: Applied Physics
language:
Short-container-title:J. Phys. D: Appl. Phys.

Author:

Chen Chi-San,Hwang Bing-Hwai,Hsu Hong-Yang Lu and Tzu-Chien

Publisher

IOP Publishing

Subject

Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://stacks.iop.org/0022-3727/35/i=20/a=321/pdf

Reference15 articles.

1. Effect of reactive gas mass flow on the composition and structure of AIN films deposited by reactive sputtering

2. A1N Substrates with High Thermal Conductivity

3. Low‐temperature growth of piezoelectric AlN film by rf reactive planar magnetron sputtering

4. Intrinsic Defects in Cubic Silicon Carbide

5. Control of preferential orientation of AlN films prepared by the reactive sputtering method

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1. Comprehensive (S)TEM characterization of polycrystalline GaN/AlN layers grown on LTCC substrates;Ceramics International;2019-05

2. Electrical and structural characteristics of sputtered c-oriented AlN thin films on Si (100) and Si (110) substrates;Thin Solid Films;2018-11

3. Structure and nanomechanical properties of Al1−xScxN thin films;Journal of Physics: Conference Series;2013-03-28

4. Columnar microstructure of nanocrystalline Ga1−xMnxN films deposited by reactive sputtering;Journal of Crystal Growth;2011-07

5. Toward the Understanding of Stacked Al-Based High-k Dielectrics for Passivation of 4H-SiC Devices;Journal of The Electrochemical Society;2011

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