Effect of reactive gas mass flow on the composition and structure of AIN films deposited by reactive sputtering-Reference-Cited by-同舟云学术

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Effect of reactive gas mass flow on the composition and structure of AIN films deposited by reactive sputtering

Published:1993-08 Issue:2 Volume:230 Page:121-127
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

E.J.-Bienk ,Jensen H.,Pedersen G.N.,Sørensen G.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. Advanced concepts of PVD hard coatings

2. Phase formation and characterization of hard coatings in the TiAlN system prepared by the cathodic arc ion plating method

3. Voltage controlled, reactive planar magnetron sputtering of AlN thin films

4. The dependence of aluminum nitride film crystallography on sputtering plasma composition

5. The influence of the reactive gas flow on the properties of AIN sputter-deposited films

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2. Multi-physical modelling, design optimization and manufacturing of a composite dielectric solar absorber;Composites Part C: Open Access;2022-07

3. Growth and Comparison of Residual Stress of AlN Films on Silicon (100), (110) and (111) Substrates;Journal of Electronic Materials;2017-11-21

4. Structural, chemical, optical and mechanical properties of Au doped AlN sputtered coatings;Surface and Coatings Technology;2014-09

5. Microstructural evolution and dielectric properties of 1D AlN powders synthesized by microwave technique;Superlattices and Microstructures;2012-06

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