Development of a Thickness Meter for Conductive Thin Films Using Four-Point Probe Method
Author:
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering
Link
https://link.springer.com/content/pdf/10.1007/s42835-021-00725-5.pdf
Reference11 articles.
1. Arther Uhlir JR (1955) The potentials of infinite systems of sources and numerical solutions of problems in semiconductor engineering. Bell Syst Tech J 34(1):105–128
2. Valdes LB (1954) Resistivity measurements on germaniumfor transistors. Proc Inst Radio Eng N Y 42:420–427
3. F. M. Smits (1958) Measurement of sheet resistivities with the four-point probe. In: Proceedings of the institute of radio engineers. pp 711–718
4. ASTM F84 Standard test method for measuring resistivity of silicon wafers with an in-line four-point probe
5. Swartzendruber LJ (1964) Correction factor tables for four-point probe resistivity measurements on thin, circular semiconductor samples. NBS Tech Note 199
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