Relationship Between Crystalline Structure and Hardness of Ti-Si-N-O Coatings Fabricated by dc Sputtering-Reference-Cited by-同舟云学术

Relationship Between Crystalline Structure and Hardness of Ti-Si-N-O Coatings Fabricated by dc Sputtering

Published:2008-08 Issue:4 Volume:17 Page:580-585
ISSN:1059-9495
Container-title:Journal of Materials Engineering and Performance
language:en
Short-container-title:J. of Materi Eng and Perform

Author:

García-González Leandro,Hernández-Torres Julián,Mendoza-Barrera Claudia,Meléndez-Lira Miguel,García-Ramírez Pedro J.,Martínez-Castillo Jaime,Sauceda Ángel,Herrera-May Agustin L.,Muñoz Saldaña Juan,Espinoza-Beltrán Francisco J.

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/s11665-007-9141-0.pdf

Reference19 articles.

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2. H. Watanabe, Y. Sato, Ch. Nie, A. Ando, S. Ohtani, N. Iwamoto, The Mechanical Properties and Microstructure of Ti-Si-N Nanocomposite Coatings by Ion Plating, Surf. Coat. Technol., 169–170, 2003, p 452–455, in English

3. J.S. Reid, E. Kolawa, C.M. Garland, M.-A. Nicolet, F. Cardone, D. Gupta, R.P. Ruiz, Amorphous (Mo, Ta, or W)-Si-N Diffusion Barriers for Al Metallizations, J. Appl. Phys., 79(2), 1996, p 1109–1115, in English

4. K. Nakajima, Y. Akasaka, K. Miyano, M. Takahashi, S. Suehiro, K. Suguro, Formation Mechanism of Ultrathin WSiN Barrier Layer in a W/WNx/Si System, Appl. Surf. Sci., 117–118, 1997, p 312–316, in English

5. F. Letendu, M.C. Hugon, B. Agius, I. Vickridge, C. Berthier, J.M. Lameille, TaSiN Diffusion Barriers Deposited by Reactive Magnetron Sputtering, Thin Solid Films, 513(1–2), 2006, p 118–124, in English

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