Multifunctional Ru-AlN heating resistor films for high efficiency inkjet printhead

Author:

Choi Woo-Chang,Wan Zhixin,Ahn Ji-Hoon,Kim Doo-In,Shin Seung-Yong,Moon Kyung-Il,Park Jin-Seong,Kwon Jung-Dae,Kwon Se-Hun

Publisher

Springer Science and Business Media LLC

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanics of Materials,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference13 articles.

1. S.L. Chiu, D.S. Wuu, Y.Y. Wu, Characteristics of heater film for ink-jet printhead. Proc. SPIE 3422, 61–68 (1998)

2. J.S. Aden, J.H. Bohórquez, D.M. Collins, M.D. Crook, A. García, U.E. Hess, The third- generation HP thermal inkjet printhead. Hewlett-Packard J. 45, 41–45 (1994)

3. C.S. Lee, J.B. Yoon, H.J. Chung, C.H. Han, A new monolithic thermal inkjet printhead using single crystalline silicon island as a heating resistor isolated by oxidized porous silicon. J. Korean Phys. Soc. 33, S458–S461 (1998)

4. J.M. Eldridge, A.R. Forouhi, G.L. Gorman, J.O. Moore, Various properties of sputter‐deposited HfB2 films. J. Electrochem. Soc. 137, 3905–3909 (1990)

5. N.D. Cuong, D.J. Kim, B.D. Kang, C.S. Kim, K.M. Yu, S.G. Yoon, Characterization of tantalum nitride thin films deposited on SiO2 ∕ Si substrates using dc magnetron sputtering for thin film resistors. J. Electrochem. Soc. 153, G164–G167 (2006)

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