Directed Self-assembly of Vertical PS-b-PMMA Nanodomains Grown on Multilayered Polyelectrolyte Films-Reference-Cited by-同舟云学术

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Directed Self-assembly of Vertical PS-b-PMMA Nanodomains Grown on Multilayered Polyelectrolyte Films

Published:2019-09-19 Issue:1 Volume:38 Page:92-99
ISSN:0256-7679
Container-title:Chinese Journal of Polymer Science
language:en
Short-container-title:Chin J Polym Sci

Author:

Liu Kai,Yang Chun-Ming,Yang Bo-Ming,Zhang Lan,Huang Wen-Chao,Ouyang Xiao-Ping,Qi Fu-Gang,Zhao Nie,Bian Feng-Gang

Publisher

Springer Science and Business Media LLC

Subject

Polymers and Plastics,Organic Chemistry,General Chemical Engineering

Link

http://link.springer.com/content/pdf/10.1007/s10118-019-2315-z.pdf

Reference45 articles.

1. Segalman, R. A. Patterning with block copolymer thin films. Mater. Sci. Eng. R2005, 48, 191–226.

2. Bai, W.; Ross, C. Functional nanostructured materials based on self-assembly of block copolymers. MRS Bull.2016, 41, 100–107.

3. Bates, C. M.; Maher, M. J.; Janes, D. W.; Ellison, C. J.; Willson, C. G. Block copolymer lithography. Macromolecules2013, 47, 2–12.

4. Stoykovich, M. P.; Kang, H.; Daoulas, K. C.; Liu, G.; Liu, C. C.; de Pablo, J. J.; Müller, M.; Nealey, P. F. Directed self-assembly of block copolymers for nanolithography: Fabrication of isolated features and essential integrated circuit geometries. ACS Nano2007, 1, 168–175.

5. Urbas, A. M.; Maldovan, M.; DeRege, P.; Thomas, E. L. Bicontinuous cubic block copolymer photonic crystals. Adv. Mater.2002, 14, 1850–1853.

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