A Facile Strategy for Non-fluorinated Intrinsic Low-k and Low-loss Dielectric Polymers: Valid Exploitation of Secondary Relaxation Behaviors-Reference-Cited by-同舟云学术

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A Facile Strategy for Non-fluorinated Intrinsic Low-k and Low-loss Dielectric Polymers: Valid Exploitation of Secondary Relaxation Behaviors

Published:2019-10-22 Issue:3 Volume:38 Page:213-219
ISSN:0256-7679
Container-title:Chinese Journal of Polymer Science
language:en
Short-container-title:Chin J Polym Sci

Author:

Qian Chao,Fan Zhen-Guo,Zheng Wei-Wen,Bei Run-Xin,Zhu Tian-Wen,Liu Si-Wei,Chi Zhen-Guo,Aldred Matthew P.,Chen Xu-Dong,Zhang Yi,Xu Jia-Rui

Publisher

Springer Science and Business Media LLC

Subject

Polymers and Plastics,Organic Chemistry,General Chemical Engineering

Link

http://link.springer.com/content/pdf/10.1007/s10118-020-2339-4.pdf

Reference39 articles.

1. Volksen, W.; Miller, R. D.; Dubois, G. Low dielectric constant materials. Chem. Rev., 2010, 110, 56–110.

2. Maier, G. Low dielectric constant polymers for microeletronics. Prog. Polym. Sci., 2001, 26, 3–65.

3. Miller, R. D. In search of low-k dielectrics. Science, 1999, 286, 421–423.

4. Hecht, J. The bandwidth bottleneck that is throttling the internet. Nature News, 2016, 536, 139–142.

5. Andrews, J. G.; Stefano, B.; Wan, C.; Stephen, V. H.; Angel, L.; Anthony, C. K. S.; Zhang, J. C. What will 5G be? IEEE Journal on Selected Areas in Communications2014, 32, 1065–1082.

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