Replication of large area nanoimprint stamp with small critical dimension loss
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Engineering,General Materials Science
Link
http://link.springer.com/content/pdf/10.1007/s11431-011-4695-3.pdf
Reference11 articles.
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2. Maximov I, Carlberg P, Wallin D, et al. Nanoimprint lithography for fabrication of three-terminal ballistic junctions in In/GaInAs. Nanotech, 2002, 13: 666–668
3. Ahn S W, Lee K D, Kim J S. Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etching. Microelectron Eng, 2005, 78–79: 314–318
4. Wu W, Cui B, Sun X Y, et al. Large area high density quantized magnetic disks fabricated using nanoimprint lithography. J Vac Sci Technol B, 1998, 16: 3825–3829
5. Falconnet D, Pasqui D, Park S, et al. A novel approach to produce protein nanopatterns by combining nanoimprint lithography and molecular self-assembly. Nano Lett, 2004, 4: 1909–1914
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Fabrication of III–V compound nanowires via hot embossing nanoimprint lithography;Japanese Journal of Applied Physics;2016-02-10
2. Nanoimprint lithography: an enabling technology for nanophotonics;Applied Physics A;2015-08-29
3. Fabrication of nanochannels using underexposed nanoimprint method;Micro & Nano Letters;2015-01
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