Nanoimprint lithography: an enabling technology for nanophotonics-Reference-Cited by-同舟云学术

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Nanoimprint lithography: an enabling technology for nanophotonics

Published:2015-08-29 Issue:2 Volume:121 Page:327-333
ISSN:0947-8396
Container-title:Applied Physics A
language:en
Short-container-title:Appl. Phys. A

Author:

Yao Yuhan,Liu He,Wang Yifei,Li Yuanrui,Song Boxiang,Bratkovsk Alexandre,Wang Shih-Yuan,Wu Wei

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s00339-015-9438-z.pdf

Reference38 articles.

1. F. Flory, L. Escoubas, G. Berginc, Optical properties of nanostructured materials: a review. J. Nanophotonics 5(1), 052502–0525020 (2011)

2. S.Y. Chou, P.R. Krauss, P.J. Renstrom, Imprint of sub-25 nm vias and trenches in polymers. Appl. Phys. Lett. 67(21), 3114–3116 (1995)

3. S.Y. Chou, P.R. Krauss, P.J. Renstrom, Nanoimprint lithography. J. Vac. Sci. Technol. B 14(6), 4129–4133 (1996)

4. Hoefflinger, B., ITRS: The International Technology Roadmap for Semiconductors, in Chips 2020, ed by B. Hoefflinger, (Springer, Berlin, Heidelberg, 2012). pp. 161–174

5. M.D. Levenson, N. Viswanathan, R.A. Simpson, Improving resolution in photolithography with a phase-shifting mask. IEEE Electron Devices Trans. 29(12), 1828–1836 (1982)

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