Thin copper films by plasma CVD using copper-hexafluoro-acetylacetonate-Reference-Cited by-同舟云学术

Thin copper films by plasma CVD using copper-hexafluoro-acetylacetonate

Published:1988-08 Issue:2 Volume:45 Page:151-154
ISSN:0721-7250
Container-title:Applied Physics A: Solids and Surface
language:en
Short-container-title:Appl. Phys. A

Author:

Oehr C.,Suhr H.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry,Physics and Astronomy (miscellaneous),General Engineering,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF02565202.pdf

Reference20 articles.

1. M.J. Hiler, W.C. Jenkin: WADC Technical Report,59–88, 1959, Astia Dokument No. 214887. (C.A.: 19667c, 1961) H.O. Pierson: Thin Solid Films45, 257–263 (1977)

2. H.M. Manasevit: Appl. Phys. Lett.12, 156–159 (1968)

3. F. Okuyama: J. Cryst. Growth49, 531–540 (1980)

4. F. Okuyama: Appl. Phys. A28, 125–128 (1982)

5. H. Mutoh, Y. Mitzukami, H. Matsui, S. Hagiwara, M. Ino: J. Electrochem. Soc.12, 987–992 (1975)

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