Thermal- and Plasma-Enhanced Copper Film Deposition via a Combined Synthesis-Transport CVD Technique
Author:
Affiliation:
1. Nikolaev Institute of Inorganic Chemistry; Siberian Branch, Russian Academy of Sciences; Novosibirsk 630090 (Russia)
2. Boreskov Institute of Catalysis, Siberian Branch; Russian Academy of Sciences; Novosibirsk 630090 (Russia)
Publisher
Wiley
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/cvde.201307078/fullpdf
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1. Copper Nanowires with a Five-Twinned Structure Grown by Chemical Vapor Deposition
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3. Stearate-Based Cu Colloids in Methanol Synthesis: Structural Changes Driven by Strong Metal-Support Interactions
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5. Principles of Chemical Vapor Deposition
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