1. Wildeer, K., Quate, C. F., Singh, B. and Kyser, D. F., “Electron beam and scanning probe lithography: a comparision,” J. Vac. Sci. Technol. B, Vol. 16, No. 6, pp. 3864–3873, 1998.
2. Betzig, E., Trautman, J. K., Wolfe, R., Gyorgy, E. M., Finn, P. L., Kryder, M. H. and Cahang, C. H., “Near-field magneto-optic and high density data storage,” Appl. Phys. Lett., Vol. 61, No. 2, pp. 142–144, 1992.
3. Lee, D.-J., Lee, K.-K., Park, N.-C. and Park, Y.-P., “Development of 3-axis Nano scanner for precision positioning in lithography system,” Processing of the IEEE, International Conference on Mechatronics & Automation, Vol. 3, pp. 1598–1603, 2005.
4. Kajihara, Y., Takeuchi, T., Takahashi, S. and Takamasu, K., “Development of an in-process confocal positioning system for nano-stereolithography using Evanescent Light,” International Journal of Precision Engineering and Manufacturing, Vol. 9, No. 3, pp. 51–54, 2008.
5. Park, J. S. and Jeong, K. W., “A study of the design and conrol system for the ultra-precision stage,” Proceedings of the KSMTE Spring Conference, pp. 54–59, 2005.