Range Distributions-Reference-Cited by-同舟云学术

Range Distributions

Published:1982 Issue: Volume: Page:177-205
ISSN:
Container-title:Ion Implantation Techniques
language:
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Author:

Ryssel Heiner

Publisher

Springer Berlin Heidelberg

Link

http://link.springer.com/content/pdf/10.1007/978-3-642-68779-2_7.pdf

Reference33 articles.

1. J. Lindhard, M. Scharff, and H.E. Schiott, Ko. Danske Videnskab., Selskab., Mat. Phys. Medd. 33, No. 14 (1963)

2. J.P. Biersack, Nucl. Inst. & Methods 182/183, 199 (1981)

3. K.B. Winterbon, Ion Implantation Range and Energy Deposition Distributions, Vol.2: Low Incident Ion Energies. IFI/Plenum Press (1973), New York

4. J.F. Gibbons, W.S. Johnson, and S.W. Mylroie, Projected Range Statistics in Semiconductors (Eds.: Dowden, Hutchinson, and Ross ), Academic Press, Stroudsburg (1975)

5. B.Smith, Ion Implantation Range Data for Silicon and Germanium Device Technologies, Learned Information ( Europe) Ltd., Oxford (1977)

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