Author:
Wilkinson C. D. W.,Beaumont S. P.
Publisher
Springer Berlin Heidelberg
Reference40 articles.
1. J.H. Hains: “The Government Role in VLSI”, in VLSI Electronics Microstructure Sciene, Vol.1, ed. by N.G. Einspruch (Academic, New York 1981) Chap.7
2. S.P. Beaumont, P.G. Bower, T. Tamamura, C.D.W. Wilkinson: Sub 20nm wide metal lines by electron beam exposure of thin PMMA films and lift-off. Appl. Phys. Lett. 38, 436 (1981)
3. G.R. Brewer: Electron Beam Technology in Microelectronic Fabrication (Academic, New York 19801
4. J. Kelly, T. Groves, H.P. Kuo: A high-current high speed electron beam litho-graphy column. J. Vac. Sci. Technol. 19, 936–940 (1981)
5. R.D. Moore, G.A. Caccoma, H.C. Pfeiffer, E.V. Weber, O.C. Woodward: EL-3 a high throughput high resolution lithography tool. J. Vac. Sci. Technol. 19, 950–952 (1981).
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