Author:
Kelly J.,Groves T.,Kuo H. P.
Cited by
35 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Electron beam lithography;Nanolithography;2014
2. Basic constraints for a multibeam lithography column;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2001
3. Electron-optical optimization for Gaussian, high-current, high-dose columns;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-11
4. Spot movement due to signal transients in multiple deflector blankers in electron beam lithography machines;Microelectronic Engineering;1998-03
5. An electron-beam microcolumn with improved resolution, beam current, and stability;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-11