LPCVD Silicon Nitride and Oxynitride Films
Author:
Publisher
Springer Berlin Heidelberg
Link
http://link.springer.com/content/pdf/10.1007/978-3-642-76593-3.pdf
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2. Ion microscope investigations of non-uniform surfaces of thin SiO2 films produced by high-temperature nitridation experiments;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2001-07
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4. SiON films deposited on Si(111) substrates—new promising materials for nonlinear optics;Materials Science and Engineering: B;1999-09
5. Hydroxylaminosilanes: Compounds with β-Donor−Acceptor Bonds;Inorganic Chemistry;1998-06-01
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