Ion microscope investigations of non-uniform surfaces of thin SiO2 films produced by high-temperature nitridation experiments-Reference-Cited by-同舟云学术

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Ion microscope investigations of non-uniform surfaces of thin SiO2 films produced by high-temperature nitridation experiments

Published:2001-07 Issue:1-4 Volume:181 Page:354-359
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Markwitz A.,Trompetter W.J.,White G.V.,Brown I.W.M.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference20 articles.

1. Semiconductor Junctions and Devices;Burford, III,1969

2. Plasma Deposited Thin Films;Mort,1986

3. P.A. van der Plas et al., in: IEEE-EDS 1987 Symposium on VLSI Technology, Karuizawa, Japan, 1987

4. Silicon Nitride for Microelectronic Applications;Millek,1971

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1. Synthesis and fluorescent thermal response of sol-gel SiO2 composite film containing nanodiamonds;Carbon;2021-10

2. Study of Thin Film Pressure Sensor by Magnetron Sputtering;Key Engineering Materials;2015-05

3. New trial methods for the detection of carbon and nitrogen in quartz samples;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2007-06

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